Detection on molecularly oxygen adsorbate during room-temperature oxidation at Si(100) surface; Synchrotron radiation light shed light on issue over 3 decades

Yoshigoe, Akitaka; Taga, Ryo*; Ogawa, Shuichi*; Takakuwa, Yuji*

no journal, , 

In this conference, the experimental evidence on the existence of molecularly adsorbed oxygen during the oxidation of Si(100)21 surface, which was considered to be absent, is reported. Synchrotron radiation photoelectron spectroscopy measurements was used to reveal its presence during the oxidation at room temperature and -150C.